Plasma Enhanced Chemical Vapour Deposition (PECVD) 2

Information

Procedure

Open procedure

Publication date

5/7/2025 1:12 PM (GMT+02:00)

Closing date

11/1/2023 11:59 PM (GMT+01:00)

Buyer

Name

Lunds Universitet

Department

Contact

Elna Rosén

Address

Box 117
22100 Lund
Sweden

Org. number

202100-3211

Closing date has passed.

Short description

The procurement includes delivery, installation and commissioning of one Plasma Enhanced Chemical Vapour Deposition System. The system will be used by a large number of operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The system is intended for deposition of thin layers of silicon dioxide (SiO2) and as close to “stoichiometric” silicon nitride (Si3N4) as possible.

Files (click "Show interest" to get access)

Name	Size
Questions and answers.pdf	34 KB
Plasma Enhanced Chemical Vapour Deposition System.pdf	428 KB
Award decision.pdf	76 KB

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