Plasma Enhanced Chemical Vapour Deposition (PECVD) 2

Information

Offenes Verfahren
07.05.2025 13:12 (GMT+02:00)
01.11.2023 23:59 (GMT+01:00)

Buyer

Lunds Universitet Lunds Universitet
Elna Rosén Elna Rosén
Box 117
22100 Lund
Schweden
202100-3211

Closing date has passed.

Short description

The procurement includes delivery, installation and commissioning of one Plasma Enhanced Chemical Vapour Deposition System. The system will be used by a large number of operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The system is intended for deposition of thin layers of silicon dioxide (SiO2) and as close to “stoichiometric” silicon nitride (Si3N4) as possible.

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Questions and answers.pdf 34 KB
Plasma Enhanced Chemical Vapour Deposition System.pdf 428 KB
Award decision.pdf 76 KB

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