Deep reactive ion etcher tool

Информация о тендерe

02 - Contract notice
Open procedure
06.12.2021 14:19 (GMT+01:00)
17.01.2022 23:59 (GMT+01:00)

Информация о покупателе

Kungliga Tekniska högskolan Kungliga Tekniska högskolan
Karin Edoff Karin Edoff
Drottning Kristinas väg 6
11428 Stockholm
Швеция
202100-3054

Closing date has passed.

Информация о тендере

Purpose of procurement KTH is seeking tenders for a new state-of-the-art research tool to be placed in the clean-room of eLAB at KTH, for research on deep-etching of silicon wafers by plasma. Mainly used for research in micro-electromechanical systems and nanotechnology.

Закупочная документация

Название Объем
1-AllDocuments.pdf 525 KB
Samtlige+vedlagte+dokumenter.zip 648 KB

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