Next generation physical vapour deposition (PVD) system

Information

Offentligt udbud
21-09-2025 16:28 (GMT+02:00)
25-03-2024 23:59 (GMT+01:00)

Indkøber

Kungliga Tekniska Högskolan Kungliga Tekniska Högskolan
Karin Edoff Karin Edoff
Brinellvägen 8
10044 Stockholm
Sverige
202100-3054
www.kth.se

Tidsfristen er overskredet

Kort beskrivelse

KTH is seeking tenders for a tool for thick-film deposition. The main application of the tool will be metallization of micro- and nanoelectronic circuits, deposition of thick hard masks for deep reactive ion etching of refractory materials, and deposition on irregular shaped and very thick substrates. The samples will mainly be large batches of individual chips and some 100 mm diameter wafers and irregular substrates.

Filer

Navn Størrelse
Samtliga bifogade dokument.zip 973 KB
Appendix 3 Tender declaration form.pdf 359 KB
Appendix 2 Chapter 13, sections 1-3, Swedish Public procurement act (20161145).pdf 252 KB
Appendix 1 Application for commercial confidentiality.docx 18 KB
Questions and answers.pdf 38 KB
Invitation to tender.pdf 200 KB
Information to tenderers.pdf 223 KB
Requirements regarding the tenderer.pdf 250 KB
Evaluation of tenders.pdf 137 KB
Technical requirements.pdf 242 KB
Draft agreement (Commercial requirements).pdf 289 KB
V-2023-0690_Beslut_om_tilldelning_i_upphandling_esignatur - signed.pdf 284 KB

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