Assignment text
Vacuum cluster connecting an ALD reactor to surface analytical instrument for Chemistry department, University of Helsinki.
The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier.