Atomic Layer Deposition system

Information

15.06.2026 14:15 (GMT+02:00)
06.07.2026 23:59 (GMT+02:00)

Buyer

Linköpings Universitet Linköpings Universitet
Anders Jonsson Wiberg
Linköping
58183 Linköping
Schweden
202100-3096
www.liu.se

Short description

LiU require an Atomic Layer Deposition (ALD) system for laboratory-scale thin film deposition. The system should support both thermal and plasma processes, with low-temperature capabilities suitable for a variety of materials, primarily oxides.

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InitialDocuments_10867051.zip 1,34 MB

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