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A complete stand-alone electron-beam evaporator system (‘Device’) specifically suitable to fabricate aluminum-based Josephson junctions using shadow evaporation. The UHV Device must provide uniform evaporation rates across 200 mm wafers in 1 vacuum chamber and the in-situ cleaning of surfaces using argon milling in a separate vacuum chamber. There must be a software running on an independent control station to steer all the processes. The Device must be compatible with remote access and automated process control. The Device must be compatible with clean room conditions.